TEL Tactras RLSA Poly Etch Chamber
TactrasTM RLSATM provides an innovative, new
plasma technology that TEL has been
optimizing for years. Microwave technology
provides high selectivity and excellent etch-
profile control with low electron temperature
of the radical-rich process by diffusion plasma.
In addition, the output microwave stability,
high repeatability, and process operation range
has been improved with microwave broadband
technology which enables precise control of
the radical/ion ratio for high profile
controllability. TactrasTM RLSATM has a high
market share for a critical application in
leading-edge logic devices.
RLSA Chamber information :
ESC for wafer with Dual He Cooling
Nihon Koshuha Microwave Generator / Model is
MKS 050B04C-OSC-V
Turbo Pump:SHIMADZU / Model is FT2301D
Generator Details:
Top MKS-050B04 PS-V
Bottom Daihen RGA-20C
Gas Box Configuration :
1 N2 5 NF3
2 TSA 6 SiH4
3 Ar
4 H2
RLSA Chamber information :
ESC for wafer with Dual He Cooling
Nihon Koshuha Microwave Generator / Model is
MKS 050B04C-OSC-V
Turbo Pump:SHIMADZU / Model is FT2301D Generator Details:
Top MKS-050B04 PS-V Bottom Daihen RGA-20C
Gas Box Configuration :
1 N2 5 NF3
2 TSA 6 SiH4
3 Ar
4 H2
